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Tungsten Oxide thin films for photonics and plasmonics

Subject of the Thesis: The activity of the Thesis will be related to the field of experimental characterization of thin films and multilayers of amorphous WO3-x, also doped with metallic nanocrystals, in view of advanced applications in the field of plasmonic sensors, and to the design of plasmonic structures.
Activity: Tungsten Oxide WO3‐x is a wide‐bandgap semiconductor, whose electronic and optical properties can be broadly tuned from dielectric to metal-like behavior, by acting on its stoichiometry and crystalline phase, in dependence on the growth method. In its nanostructured forms it appeals to a large number of promising applications, ranging from electrochromism to photoelectrochemistry, to photocatalysis and sensing.
WO3-x layers will be grown by RF sputtering technique and characterized in terms of their morphology, structure, composition, as well as from the point of view of their dielectric and optical response in the UV‐VIS‐near IR range. Dielectric properties at the nanoscale and plasmonic resonance behavior will also be investigated. Experimental results will be discussed and compared to theoretical models.
Required skills: Notions of optical propagation and dielectric and electronic properties of materials. Attitude and interest for numerical modelling and design. The candidate will be trained in the use of specific software, when needed.